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Author Topic: Wet etch of SiN4 using chemical  (Read 3480 times)

Offline jaypal

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Wet etch of SiN4 using chemical
« on: 30/03/2009 08:20:50 »
post your comments on wetetch of  silicon nitrade etch using chemical


 

Offline Chemistry4me

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Wet etch of SiN4 using chemical
« Reply #1 on: 30/03/2009 08:52:11 »
Heated Phosphoric Acid.
 

Offline jaypal

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Wet etch of SiN4 using chemical
« Reply #2 on: 30/03/2009 09:29:55 »
hi,

  Heated phosophoric acid will corrode bond wire ?
 

Offline Chemistry4me

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Wet etch of SiN4 using chemical
« Reply #3 on: 30/03/2009 09:35:08 »
What wire?
 

Offline Chemistry4me

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Wet etch of SiN4 using chemical
« Reply #4 on: 30/03/2009 09:38:49 »
Wait a second, I thought you meant silicon nitride!
Does silicon nitrade even exist? I searched on Google and can't find anything on the structure. ???
 

Offline jaypal

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Wet etch of SiN4 using chemical
« Reply #5 on: 30/03/2009 09:46:48 »
silicon nitride is the passivation processed on top layer
 

Offline Chemistry4me

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Wet etch of SiN4 using chemical
« Reply #6 on: 30/03/2009 09:51:02 »
Read http://people.cecs.ucf.edu/todi/Publication1.pdf from page 110.
I think that is what you are looking for. :)
 

Offline Dr.IC

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Wet etch of SiN4 using chemical
« Reply #7 on: 31/03/2009 04:59:15 »
Is there any other way, because we need Plasma etch machine to do this.... Like using only chemical without machine. ???.....
 

Offline lightarrow

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Wet etch of SiN4 using chemical
« Reply #8 on: 31/03/2009 13:05:13 »
Is there any other way, because we need Plasma etch machine to do this.... Like using only chemical without machine. ???.....
Quote
Wet etching studies were performed using two etchants, namely phosphoric acid (85% H3PO4) and  buffered oxide etch (BOE) solution. BOE consisted of 9 parts of NH4F (40%) and 1 part of HF (49%) by volume.
 

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Wet etch of SiN4 using chemical
« Reply #8 on: 31/03/2009 13:05:13 »

 

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